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Quality High Purity Custom Quartz Furnace Tube Large Diameter For Semiconductor factory
Quality High Purity Custom Quartz Furnace Tube Large Diameter For Semiconductor factory
Quality High Purity Custom Quartz Furnace Tube Large Diameter For Semiconductor factory
Quality High Purity Custom Quartz Furnace Tube Large Diameter For Semiconductor factory
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High Purity Custom Quartz Furnace Tube Large Diameter For Semiconductor

Brand Name: XT
Place of Origin: China
Certification: CE
Minimum Order Quantity: 1

Product Details


Material: 99.99% Fused Quartz Metal Ion Content: Na/K/Fe < 1ppm
Working Temperature: 1100-1200°C, Up To 1350°C Outside Diameter: φ40mm - φ500mm
Wall Thickness: 2mm - 15mm Max Length: 3 Meters+
Structure: Straight, Open-end, Flanged Application: Semiconductor Diffusion Furnace
Highlight

High Purity quartz tube

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Semiconductor Quartz Furnace Tube

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Custom Quartz Furnace Tube

Product Description

1. Ultra-High Purity – Core of Clean Processes

  • SiO₂ purity ≥ 99.99%, premium grades up to 99.995%
  • Extremely low metal ion content (Na/K/Fe etc. < 1ppm)
  • No devitrification, volatilization or particle shedding at high temperatures
  • The "first line of defense" for semiconductor wafer yield — a contaminated furnace tube can ruin an entire wafer batch

2. Extreme Heat Resistance – Stable at Large Diameters

  • Long-term service temperature 1100°C – 1200°C, short-term up to 1350°C+
  • Softening point approx. 1700°C — large-diameter tubes resist sagging and deformation at high temperatures
  • Compatible with mainstream high-temperature processes: diffusion, oxidation, annealing, LPCVD

3. Uniform Temperature – Stable Thermal Field

  • Excellent thermal conductivity and radiant heat transfer of quartz material
  • Uniform wall thickness ensures a consistent temperature field inside the furnace
  • Works with temperature control systems for precise control at ±0.5°C level
  • Ensures identical process conditions for every wafer

4. Ultra-Low Thermal Expansion – Superior Thermal Shock Resistance

  • Thermal expansion coefficient of only 5.5×10⁻⁷/°C (near-zero expansion)
  • Outstanding thermal shock resistance — no cracking under frequent heating/cooling cycles
  • Dimensionally stable after repeated thermal cycling — no long-term warping or deformation

5. Strong Corrosion Resistance – Tolerates Process Atmospheres

  • Resists strong acids (except HF) and most process gases
  • No reaction with chlorine, oxygen or dopant gases (phosphine / diborane etc.) at high temperatures
  • Resists erosion and deposit buildup — easy to clean, long service life

6. Fully Transparent – Observation & Radiant Heating

  • Fully transparent walls with high UV-to-IR transmittance
  • Supports infrared radiant heating for high thermal efficiency
  • Real-time visibility of furnace conditions for easy process monitoring

7. Precise Dimensions – Fits Various Furnace Types

  • Strict control of tube diameter, wall thickness and length tolerances
  • Excellent straightness, roundness and wall thickness uniformity
  • Compatible with mainstream horizontal and vertical furnace models
  • Custom manufacturing supported per equipment drawings

8. Complete Specifications – Deep Customization

  • Outer diameter: φ40mm – φ500mm (larger available on request)
  • Wall thickness: 2mm – 15mm options
  • Length: customizable up to 3 meters or more
  • Structures: straight tube, open both ends, sealed one end, flanged tube
  • Processing: flame-polished ends, polishing, chamfering, flange fitting
  • Accessories: quartz boats, tube plugs and support components available

Product Highlights

1. Ultra-High Purity – Core of Clean Processes SiO₂ purity ≥ 99.99%, premium grades up to 99.995% Extremely low metal ion content (Na/K/Fe etc. < 1ppm) No devitrification, volatilization or particle shedding at high temperatures The "first line of defense" for semiconductor wafer yield — a ...

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