High Purity Custom Quartz Furnace Tube Large Diameter For Semiconductor
Product Details
| Material: | 99.99% Fused Quartz | Metal Ion Content: | Na/K/Fe < 1ppm |
|---|---|---|---|
| Working Temperature: | 1100-1200°C, Up To 1350°C | Outside Diameter: | φ40mm - φ500mm |
| Wall Thickness: | 2mm - 15mm | Max Length: | 3 Meters+ |
| Structure: | Straight, Open-end, Flanged | Application: | Semiconductor Diffusion Furnace |
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High Purity quartz tube,Semiconductor Quartz Furnace Tube,Custom Quartz Furnace Tube |
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Product Description
1. Ultra-High Purity – Core of Clean Processes
- SiO₂ purity ≥ 99.99%, premium grades up to 99.995%
- Extremely low metal ion content (Na/K/Fe etc. < 1ppm)
- No devitrification, volatilization or particle shedding at high temperatures
- The "first line of defense" for semiconductor wafer yield — a contaminated furnace tube can ruin an entire wafer batch
2. Extreme Heat Resistance – Stable at Large Diameters
- Long-term service temperature 1100°C – 1200°C, short-term up to 1350°C+
- Softening point approx. 1700°C — large-diameter tubes resist sagging and deformation at high temperatures
- Compatible with mainstream high-temperature processes: diffusion, oxidation, annealing, LPCVD
3. Uniform Temperature – Stable Thermal Field
- Excellent thermal conductivity and radiant heat transfer of quartz material
- Uniform wall thickness ensures a consistent temperature field inside the furnace
- Works with temperature control systems for precise control at ±0.5°C level
- Ensures identical process conditions for every wafer
4. Ultra-Low Thermal Expansion – Superior Thermal Shock Resistance
- Thermal expansion coefficient of only 5.5×10⁻⁷/°C (near-zero expansion)
- Outstanding thermal shock resistance — no cracking under frequent heating/cooling cycles
- Dimensionally stable after repeated thermal cycling — no long-term warping or deformation
5. Strong Corrosion Resistance – Tolerates Process Atmospheres
- Resists strong acids (except HF) and most process gases
- No reaction with chlorine, oxygen or dopant gases (phosphine / diborane etc.) at high temperatures
- Resists erosion and deposit buildup — easy to clean, long service life
6. Fully Transparent – Observation & Radiant Heating
- Fully transparent walls with high UV-to-IR transmittance
- Supports infrared radiant heating for high thermal efficiency
- Real-time visibility of furnace conditions for easy process monitoring
7. Precise Dimensions – Fits Various Furnace Types
- Strict control of tube diameter, wall thickness and length tolerances
- Excellent straightness, roundness and wall thickness uniformity
- Compatible with mainstream horizontal and vertical furnace models
- Custom manufacturing supported per equipment drawings
8. Complete Specifications – Deep Customization
- Outer diameter: φ40mm – φ500mm (larger available on request)
- Wall thickness: 2mm – 15mm options
- Length: customizable up to 3 meters or more
- Structures: straight tube, open both ends, sealed one end, flanged tube
- Processing: flame-polished ends, polishing, chamfering, flange fitting
- Accessories: quartz boats, tube plugs and support components available
Product Highlights
1. Ultra-High Purity – Core of Clean Processes SiO₂ purity ≥ 99.99%, premium grades up to 99.995% Extremely low metal ion content (Na/K/Fe etc. < 1ppm) No devitrification, volatilization or particle shedding at high temperatures The "first line of defense" for semiconductor wafer yield — a ...
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